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| Thesis Name： |
Chemical vapor deposition of organosilicon composite thin films for porous low-k dielectrics |
| Usage： |
Chemical Engineering |
| Keyword： |
Chemical Engineering |
| Remarks： |
Pulsed plasma enhanced chemical vapor deposition has produced organosilicon thin films with the potential use as low dielectric constant interconnect materials in microelectronic circuits. Both diethylsilane and octamethylcyclotetrasiloxane precursors were used, with oxygen and hydrogen peroxides oxidants respectively, to deposit low-k organosilicon films. FTIR, nanoindentation, ellipsometry, and dielectric constant measurements were demonstrated as a valuable film characterization tools to understand structure-property-processing fundamentals by quantifying structural bonding environments and relating those to the film properties. Nanocomposites were also produced using two novel techniques. First, crystal colloidal templates of polystyrene nanospheres were fabricated using evaporation-induced self-assembly. OSG was then deposited throughout the templates to create composite materials. Subsequently the polystyrene was removed upon thermal annealing to create highly porous OSG thin fil... |
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Promulgator Detail |
| Full name: |
lorry |
| Country: |
CN |
| City: |
dalian |
| Company Name: |
Teloon corporation |
| Homepage: |
http:// |
| E-mail: |
reply |
| Phone: |
0411-82811662 |
| Fax: |
86-411-82819667 |
| Company Address: |
remin road,dalian city,liaoning,china |
| Zip/Postal Code: |
116001 |
| Introduction: |
Founded in 1994, Teloon Chemicals Corporation is a professional chemical exporter and producer in China. TeloonChem is located in the beautiful coastal city Dalian, the trade, commercial and financial center of Northeast China. |
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